Schrödinger's Cat, Clauser's Interferometer, and Impossible Optics

OSA Presidential Speaker
Note: Meeting to be held at Goodrich

I will make an excursion into one of the longest-running frontier areas of physics, which is the  weird character of quantum mechanics itself. Illustrations will include a description of experiments with  the Clauser Interferometer, one of the new optical devices invented for study in this domain.  Schrödinger's Cat is no longer just an academic matter, and on-going studies are providing startling answers to questions about the reality of the natural world. I'll offer a proof, for example, showing that the square of the cosine of a real angle is larger than the cosine itself, thus contradicting high school trigonometry.

Goodrich will need the name and citizenship for each attendee. Please include this when you make a reservation. All are welcome to this talk regardless of citizenship.

A history of the Optical Print Display Hologram

The advent of the commercial Hologram industry in the early 1980's lead to the development of small to large format optical display holograms as large as 2 meters square, and has progressed to larger format digital holographic imaging technology in full color available today.  Where has the market gone?  Was this a promise unfulfilled or yet to be realized.

Advanced Lithography and the Semiconductor Industry Roadmap

Semiconductor devices are expected to continue their historic trend of diminishing size for at least several more device generations. Patterning at 65-, 45-, 32-nm and beyond is being enabled by new developments in optical lithography. “Conventional” 193-nm projection lithography will be replaced by liquid immersion lithography, double patterning processes, sophisticated mask design, and other technologies. Alternative lithographies, such as extreme ultraviolet (EUV) projection, electron-beam direct write, and nanoimprint, must compete with enhanced optical lithography in terms of cost, yield, and throughput. This talk will discuss the various aspects of sub-65 nm optical lithography, and place them in the broader context of the semiconductor industry roadmap. Topics will include prospects of high-index liquid immersion lithography, the applicability of double patterning, resist limitations, as well as new lithographic concepts.